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 SM ISO690:2012BESHENTSEVA, O., KALUGIN, V., OPALEVA, N., SIDORENKO, O.. The Peculiarities of the Kinetics of Silver Chemical Deposition on Dielectrics with Various Technologies of the Surface Activation
. In: Surface Engineering and Applied Electrochemistry, 2010, nr. 1(46), pp. 16-20. ISSN 1068-3755. |
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  Surface Engineering and Applied Electrochemistry |
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| Numărul 1(46) / 2010 / ISSN 1068-3755 /ISSNe 1934-8002 | ||||||
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| Pag. 16-20 | ||||||
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The chemical reduction of single charged ions of metal (Ar ) under the conditions of a hydrodynamic mode on a rotating cylindrical dielectric (D) specimen is first studied. The partial manifestation of the effect of the hydrodynamical rate limitation (HDRL) of silver deposition has been determined. It has been established that the complete manifestation of the HDRL (VAg = 0) effect is blocked by the development of the process of the concentration increasing of the electro active particles in the reactionary zone due to the
increase of the amount of collisions of the noncompact silver deposit (growing in the reactor volume) and the oxidation products of the reducer (inverted sugar) with a surface of a compact Ag layer on the D specimen. The results of this research confirm the conceptions concerning the mechanism of the HDRL phenomenon–due to the repulsion of electro active particles of silver from the reactionary layer at high speeds of rotation.
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