Porous vs. Magnetron rf sputtering of inp for portable THz-TDS in pharmaceutical and medical applications

Sirbu Lilian; Dǎnilǎ Mihai; Muller Raluca; Ghimpu Lidia; Dobletbaev R.; Dascălu Traian; Grigore (Sandu) O.; Sarua Andrei; Ursachi Veaceslav

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SIRBU, Lilian, DǍNILǍ, Mihai, MULLER, Raluca, GHIMPU, Lidia, DOBLETBAEV, R., DASCĂLU, Traian, GRIGORE (SANDU), O., SARUA, Andrei, URSACHI, Veaceslav. Porous vs. Magnetron rf sputtering of inp for portable THz-TDS in pharmaceutical and medical applications. In: Nanotechnologies and Biomedical Engineering, Ed. 2, 18-20 aprilie 2013, Chișinău. Technical University of Moldova, 2013, Editia 2, pp. 161-162. ISBN 978-9975-62-343-8..

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Nanotechnologies and Biomedical Engineering
Editia 2, 2013

Conferința "International Conference on Nanotechnologies and Biomedical Engineering"
2, Chișinău, Moldova, 18-20 aprilie 2013

Porous vs. Magnetron rf sputtering of inp for portable THz-TDS in pharmaceutical and medical applications

Pag. 161-162

Sirbu Lilian¹, Dǎnilǎ Mihai², Muller Raluca², Ghimpu Lidia¹, Dobletbaev R.³, Dascălu Traian⁴, Grigore (Sandu) O.⁴, Sarua Andrei⁵, Ursachi Veaceslav⁶³

¹ Institute of the Electronic Engineering and Nanotechnologies "D. Ghitu",
² National Institute for Research and Development in Microtechnology, IMT-Bucharest,
³ Technical University of Moldova,
⁴ National Institute for Laser, Plasma and Radiation Physics (INFLPR),
⁵ H.H. Wills Physics Laboratory, University of Bristol,
⁶ Institute of Applied Physics, Academy of Sciences of Moldova

Proiecte:

Menționat în lucrare: 12.819.15.20A Dispozitive emiţătoare de lumină în baza nanocopoziţilor organici şi anorganici

Menționat în lucrare: 266515 Preparation for Moldova's integration into the European Research Area and into the Community R&D Framework Programs on the basis of scientific excellence

Disponibil în IBN: 17 iunie 2019

Rezumat

We developed a combination of technology for deposition contacts/wires upon nanoporous InP thin film structures and RF sputtering InP films. Indium phosphide (InP) films were deposited onto glass substrate using RF magnetron sputtering by varying the substrate temperature (50–100oC), under constant argon pressure (6.3•10-3Bar) and RF power (100 W).

Cuvinte-cheie
InP film, RF sputtering, Porous InP, THz antenna, THz-TDS.