Doped boro-phosphate vitreous materials as PLD thin films, obtaining and properties
Închide
Articolul precedent
Articolul urmator
619 0
SM ISO690:2012
SAVA, Bogdan Alexandru, BOROICA, Lucica, ELIŞA, Mihail, SOCOL, G., ANDREI, A., NICULESCU, A., ŞIKIMAKA, Olga, GRABCO, Daria. Doped boro-phosphate vitreous materials as PLD thin films, obtaining and properties. In: Materials Science and Condensed Matter Physics, Ed. 7, 16-19 septembrie 2014, Chișinău. Chișinău, Republica Moldova: Institutul de Fizică Aplicată, 2014, Editia 7, p. 135.
EXPORT metadate:
Google Scholar
Crossref
CERIF

DataCite
Dublin Core
Materials Science and Condensed Matter Physics
Editia 7, 2014
Conferința "Materials Science and Condensed Matter Physics"
7, Chișinău, Moldova, 16-19 septembrie 2014

Doped boro-phosphate vitreous materials as PLD thin films, obtaining and properties


Pag. 135-135

Sava Bogdan Alexandru1, Boroica Lucica1, Elişa Mihail2, Socol G.1, Andrei A.1, Niculescu A.1, Şikimaka Olga3, Grabco Daria3
 
1 National Institute for Laser, Plasma and Radiation Physics (INFLPR),
2 Institute of Optoelectronics Bucarest-Magurele,
3 Institute of Applied Physics, Academy of Sciences of Moldova
 
 
Disponibil în IBN: 4 martie 2019


Rezumat

Doped boro-phosphate vitreous thin films were obtained using PLD (pulsed laser deposition) technique. The vitreous target comprises network formers P2O5 and B2O3, together with modifiers Li2O, Al2O3, stabilizers, ZnO and dopants, PbO and Bi2O3. The dopants were added in the glass composition in order to induce magnetic and magneto-optical properties. Complex boro - phosphate target glasses containing dopants in total 6 mol. % amount were prepared using p.a. reagents by a wet raw materials preparation route [1] followed by melt-quenching of the batch glass in electric furnace at 1250 0C for 4 hours. The mechanical behavior of the target was investigated using the microindentation technique [2]. Vickers microhardness for the bismuth oxide-lead oxide doped samples has values around 700 daN/mm2 for loads of 50-100 g. A pulsed KrF excimer laser (CompexPro 201-Coherent) operating at 248 nm, with a repetition rate of 10 Hz and pulse width of 20 ns, was used as source for the ablation process. The best results regarding the quality of the deposition were obtained at 600oC substrate temperature, 2.7 J/cm2 fluency and 10-7 bar pressure after 12500 laser pulses. AFM investigations exemplified in the figure bellow showed that the substrate temperature influences the thickness of the PLD thin films. The thickness of the PLD thin film on substrate heated at 400°C was almost double as the one on substrate heated at 600°C. XRD investigations performed with the 'Pert PRO MPD (panalytical.com) equipment, using CuKα, at angles 2θ between 5 and 40 showed the vitreous state of the deposited thin films.