Reversible Polarization Recording in As2S3–Se Multilayer Nanostructures
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MESHALKIN, Alexei. Reversible Polarization Recording in As2S3–Se Multilayer Nanostructures. In: Surface Engineering and Applied Electrochemistry. 2018, nr. 4(54), pp. 407-414. ISSN 1068-3755.
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Surface Engineering and Applied Electrochemistry
Numărul 4(54) / 2018 / ISSN 1068-3755 /ISSNe 1934-8002

Reversible Polarization Recording in As2S3–Se Multilayer Nanostructures

DOI: 10.3103/S1068375518040129
Pag. 407-414

Meshalkin Alexei
Institute of Applied Physics
Disponibil în IBN: 7 decembrie 2018


Polarization holographic recording of diffraction gratings and their subsequent erasure have been investigated on As2S3–Se multilayer nanostructures. The work investigates how preexposure to actinic laser radiation up to complete photoinduced changes in the optical properties affects the formation of diffraction gratings in the studied structure. It is shown that the preexposure of an As2S3–Se multilayer nanostructure (MNS) leads to photobleaching, and the maximum achievable diffraction efficiency (DE) of 35% does not change; however, the required exposure value is increased. It is also shown that exposure using one laser beam results in complete erasure of the diffraction grating recorded up to the maximum. Seven recording–erasure cycles show that the kinetics of the increase in diffraction efficiency and its maximum value do not change, which indicates that the As2S3–Se multilayer structure is capable of reversible holographic recording under orthogonal circular polarization. Study of the gratings recorded with an atomic-force microscope shows that the main factor determining the diffraction efficiency value is modulation of the relief, the depth of which is greater than 200 nm.

chalcogenide multilayer nanostructures, direct surface relief formation, reversible holographic recording,

diffraction efficiency