Photoluminescence of chemical bath deposited ZnO:Al films treated by rapid thermal annealing

Shishiyanu Sergiu; Lupan Oleg; Monaico Eduard; Ursachi Veaceslav; Shishiyanu Teodor; Tiginyanu Ion

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SHISHIYANU, Sergiu, LUPAN, Oleg, MONAICO, Eduard, URSACHI, Veaceslav, SHISHIYANU, Teodor, TIGINYANU, Ion. Photoluminescence of chemical bath deposited ZnO:Al films treated by rapid thermal annealing. In: Thin Solid Films, 2005, nr. 1-2(488), pp. 15-19. ISSN -. DOI: https://doi.org/10.1016/j.tsf.2005.04.004

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Thin Solid Films

Numărul 1-2(488) / 2005 / ISSN - /ISSNe 0040-6090

Photoluminescence of chemical bath deposited ZnO:Al films treated by rapid thermal annealing

DOI:https://doi.org/10.1016/j.tsf.2005.04.004

Pag. 15-19

Shishiyanu Sergiu¹, Lupan Oleg¹, Monaico Eduard¹, Ursachi Veaceslav², Shishiyanu Teodor¹, Tiginyanu Ion¹²

¹ Technical University of Moldova,
² Institute of Applied Physics, Academy of Sciences of Moldova

Disponibil în IBN: 12 aprilie 2018

Rezumat

Aluminum-doped zinc oxide (ZnO:Al) films fabricated by chemical bath deposition are characterized using scanning electron microscopy and photoluminescence (PL) spectroscopy. The impact of rapid thermal annealing (RTA) upon the morphology and luminescence characteristics of ZnO:Al layers is studied in an annealing temperature interval up to 650 °C. The as deposited films consist of high quality microcrystalline grains surrounded by a material of poor quality. RTA at temperatures around 650°C proves to increase the grain size, enhance the ultraviolet PL with simultaneous suppression of the visible luminescence, and activate the Al donor impurities.

Cuvinte-cheie
Luminescence, Rapid thermal annealing, surface morphology, zinc oxide

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