Nanostructuring induced enhancement of radiation hardness in GaN epjlayers
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URSACHI, Veaceslav, TIGINYANU, Ion, VOLCIUC, Olesea, POPA, Veaceslav, SKURATOV, Vladimir, MORCOC, Hadis. Nanostructuring induced enhancement of radiation hardness in GaN epjlayers. In: Applied Physics Letters, 2007, vol. 90, p. 0. ISSN 0003-6951. DOI: https://doi.org/10.1063/1.2723076
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Applied Physics Letters
Volumul 90 / 2007 / ISSN 0003-6951

Nanostructuring induced enhancement of radiation hardness in GaN epjlayers

DOI:https://doi.org/10.1063/1.2723076

Pag. 0-0

Ursachi Veaceslav1, Tiginyanu Ion2, Volciuc Olesea1, Popa Veaceslav1, Skuratov Vladimir3, Morcoc Hadis4
 
1 Technical University of Moldova,
2 Institute of Applied Physics, Academy of Sciences of Moldova,
3 Joint Institute of Nuclear Research,
4 Virginia Commonwealth University
 
 
Disponibil în IBN: 10 aprilie 2018


Rezumat

The radiation hardness of as-grown and electrochemically nanostructured GaN epilayers against heavy ion irradiation was studied by means of photoluminescence (PL) and resonant Raman scattering (RRS) spectroscopy. A nanostructuring induced enhancement of the GaN radiation hardness by more than one order of magnitude was derived from the PL and RRS analyses. These findings show that electrochemical nanostructuring of GaN layers is a potentially attractive technology for the development of radiation hard devices.

Cuvinte-cheie
Electrochemical nanostructuring, Radiation hard devices