Unconventional metal-insulator transition in RexSi1-x
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ARUSHANOV, Ernest, LISUNOV, Konstantin, SCHUMANN, Joachim, VINZELLBERG, H. Unconventional metal-insulator transition in RexSi1-x. In: Moldavian Journal of the Physical Sciences, 2010, nr. 3-4(9), pp. 252-256. ISSN 1810-648X.
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Moldavian Journal of the Physical Sciences
Numărul 3-4(9) / 2010 / ISSN 1810-648X /ISSNe 2537-6365

Unconventional metal-insulator transition in RexSi1-x


Pag. 252-256

Arushanov Ernest1, Lisunov Konstantin1, Schumann Joachim2, Vinzellberg H2
 
1 Institute of Applied Physics, Academy of Sciences of Moldova,
2 Institut fuer Integrative Nanowissenschaften, Leibniz-Institut fuer Festkoerper- und Werkstoffforschung Dresden
 
 
Disponibil în IBN: 19 noiembrie 2013


Rezumat

Low-temperature resistivity of the amorphous RexSi1-x thin films at x < xc is governed by the Mott and the Shklovskii-Efros variable-range hopping (VRH) conductivity mecha- nisms, where xc ≈ 0.327 corresponds to the metal-insulator transition (MIT). The critical exponent of the dielectric permittivity, η = 2.1 ± 0.2, is found to be in agreement with the theoretical prediction, η = 2. The critical exponent of the correlation length, ν ≈ 0.8 – 1.1 close to the expected value of unity is obtained under an assumption of a strong underbarrier scattering of hopping charge carriers.