| Conţinutul numărului revistei |
| Articolul precedent |
| Articolul urmator |
 |
 777 2 |
| Ultima descărcare din IBN: 2022-07-14 21:55 |
 SM ISO690:2012PALISTRANT, Natalia. Nanomechanical parameters of new carbazolyle-containing photoresist polymers. In: Moldavian Journal of the Physical Sciences, 2005, nr. 4(4), pp. 468-472. ISSN 1810-648X. |
| EXPORT metadate: Google Scholar Crossref CERIF DataCite Dublin Core |
| Moldavian Journal of the Physical Sciences | ||||||
| Numărul 4(4) / 2005 / ISSN 1810-648X /ISSNe 2537-6365 | ||||||
|
||||||
| Pag. 468-472 | ||||||
|
||||||
 Descarcă PDF |
||||||
| Rezumat | ||||||
The new photopolymer layers from carbazolemethacrylates (CAM) with
oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and
investigated by us. Load and depth sensing indentation with a Berkovich indenter were
performed in order to evaluate the nanomechanical parameters of polymer films. The
reliability of the chosen analytical method was checked using number of repeats. The
influence of chemical composition, action of UF-light and aging on the nanomechanical
properties of CAM: OMA and PEPC were investigated. |
||||||
|
|
|
|
