Conţinutul numărului revistei |
Articolul precedent |
Articolul urmator |
258 1 |
Ultima descărcare din IBN: 2023-07-23 22:00 |
SM ISO690:2012 DRAGOMAN, Mircea L., DINESCU, Adrian, AVRAM, Andrei, DRAGOMAN, Daniela, VULPE, Silviu, ALDRIGO, Martino, BRANISTE, Tudor, SUMAN, Victor, RUSU, Emil, TIGINYANU, Ion. Ultrathin tin sulfide field-effect transistors with subthreshold slope below 60 mV/decade. In: Nanotechnology, 2022, vol. 33, pp. 1-7. ISSN 0957-4484. DOI: https://doi.org/10.1088/1361-6528/ac7cf8 |
EXPORT metadate: Google Scholar Crossref CERIF DataCite Dublin Core |
Nanotechnology | |
Volumul 33 / 2022 / ISSN 0957-4484 | |
|
|
DOI:https://doi.org/10.1088/1361-6528/ac7cf8 | |
Pag. 1-7 | |
Rezumat | |
In this paper, we present for the first time a field-effect-transistor (FET) having a 10 nm thick tin sulfide (SnS) channel fabricated at the wafer scale with high reproducibility. SnS-based FETs are in on-state for increasing positive back-gate voltages up to 6 V, whereas the off-state is attained for negative back-gate voltages not exceeding -6 V, the on/off ratio being in the range 102-103 depending on FET dimensions. The SnS FETs show a subthreshold slope (SS) below 60 mV/decade thanks to the in-plane ferroelectricity of SnS and attaining a minimum value SS = 21 mV/decade. Moreover, the low SS values can be explained by the existence of a negative value of the capacitance of the SnS thin film up to 10 GHz (for any DC bias voltage between 1 and 5 V), with the minimum value being -12.87 pF at 0.1 GHz. |
|
Cuvinte-cheie 2D materials ferroelectricity, ferroelectrics, microwaves, RF magnetron sputtering, Semiconductors, thin films, tin sulfide |
|
|
Dublin Core Export
<?xml version='1.0' encoding='utf-8'?> <oai_dc:dc xmlns:dc='http://purl.org/dc/elements/1.1/' xmlns:oai_dc='http://www.openarchives.org/OAI/2.0/oai_dc/' xmlns:xsi='http://www.w3.org/2001/XMLSchema-instance' xsi:schemaLocation='http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd'> <dc:creator>Dragoman, M.</dc:creator> <dc:creator>Dinescu, A.</dc:creator> <dc:creator>Avram, A.</dc:creator> <dc:creator>Dragoman, D.</dc:creator> <dc:creator>Vulpe, S.</dc:creator> <dc:creator>Aldrigo, M.</dc:creator> <dc:creator>Branişte, F.V.</dc:creator> <dc:creator>Suman, V.</dc:creator> <dc:creator>Rusu, E.V.</dc:creator> <dc:creator>Tighineanu, I.M.</dc:creator> <dc:date>2022-10-01</dc:date> <dc:description xml:lang='en'><p>In this paper, we present for the first time a field-effect-transistor (FET) having a 10 nm thick tin sulfide (SnS) channel fabricated at the wafer scale with high reproducibility. SnS-based FETs are in on-state for increasing positive back-gate voltages up to 6 V, whereas the off-state is attained for negative back-gate voltages not exceeding -6 V, the on/off ratio being in the range 102-103 depending on FET dimensions. The SnS FETs show a subthreshold slope (SS) below 60 mV/decade thanks to the in-plane ferroelectricity of SnS and attaining a minimum value SS = 21 mV/decade. Moreover, the low SS values can be explained by the existence of a negative value of the capacitance of the SnS thin film up to 10 GHz (for any DC bias voltage between 1 and 5 V), with the minimum value being -12.87 pF at 0.1 GHz.</p></dc:description> <dc:identifier>10.1088/1361-6528/ac7cf8</dc:identifier> <dc:source>Nanotechnology () 1-7</dc:source> <dc:subject>2D materials ferroelectricity</dc:subject> <dc:subject>ferroelectrics</dc:subject> <dc:subject>microwaves</dc:subject> <dc:subject>RF magnetron sputtering</dc:subject> <dc:subject>Semiconductors</dc:subject> <dc:subject>thin films</dc:subject> <dc:subject>tin sulfide</dc:subject> <dc:title>Ultrathin tin sulfide field-effect transistors with subthreshold slope below 60 mV/decade</dc:title> <dc:type>info:eu-repo/semantics/article</dc:type> </oai_dc:dc>