Silicon anisotropic etch using koh, p-terbutylcalix[6]arene and C-methyl calix[4]resorcinarene
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SERBAN, Bogdan. Silicon anisotropic etch using koh, p-terbutylcalix[6]arene and C-methyl calix[4]resorcinarene. In: International Conference of Young Researchers , Ed. 8, 11-12 noiembrie 2010, Chişinău. Chişinău: Tipogr. Simbol-NP SRL, 2010, Ediția 8, p. 69. ISBN 978-9975-9898-4-8..
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International Conference of Young Researchers
Ediția 8, 2010
Conferința "International Conference of Young Researchers "
8, Chişinău, Moldova, 11-12 noiembrie 2010

Silicon anisotropic etch using koh, p-terbutylcalix[6]arene and C-methyl calix[4]resorcinarene


Pag. 69-69

Serban Bogdan
 
 
Disponibil în IBN: 4 mai 2021


Rezumat

The silicon anisotropic etching in alkaline systems is a key technology for sensor design and microsystem field [1]. In the last time, potassium hydroxide, a well-known anisotropic silicon etchant was used in conjunction with different types of macrocyclic compound from the class of calixarenes of crown ethers with interesting result regarding the silicon etch rate and the roughness of the surface[1-4]. The focus of this investigation was the anisotropic etching of silicon in KOH 4,5M solution using p-tertbutylcalix[6]arene (fig.1) C-methyl calix[4]resorcinarene( fig.2) and a mixture of these[5]. Fig.1 The structure of p-tertbutylcalix[6]arene Fig.2 The structure of C-methyl calix[4]resorcinarene Both calixarenes-based complexing agents exhibit useful properties for increasing the etching rate and the quality of the silicon surface: resemble pyrocatechol,( used in several proposed recipes for silicon etching), act as K+ cation complexant, has tensoactive character , act as Si(OH)4 complexant and is soluble in alkaline medium Due to the ― catching‖ of K+ cation through complexation ( endo- complexation or ionic pairs) at the interface wafer/ KOH solution, both calixarenic macrocyclic ligand increase the availability of the OH- anions in order to etch the wafer: K+ OH- + calix[n]arenic complexant → OH- free + K+…calixarenic complexant [1] The silicon etching of silicon is accelerated in the presence of both calixarenic compounds. P-terbutylcalix[6]arene is better from the etching rate point of view, and this result are in agreement with the theoretical predictions. Synthesis of P-terbutylcalix[6]arene is performed with KOH and the template effect due to the presence of K+ plays an important role. From these reasons, we can anticipate that this type of calixarenic compound could accelerate the etching rate for CsOH as etchant, also. However, the best result are obtained if we used an echimolecular mixture of these supramolecular compounds in alkaline solution.

Cuvinte-cheie
Silicon, etching, p-terbutylcalix[6]arene, C-methylcalix[4]resorcinarene