Afișare rezultate
Deformation mechanisms under nanoscratching of Si: Effect of scratching speed, load and indenter orientation |
Şikimaka Olga1, Prisăcaru Andrian12 |
1 Institute of Applied Physics, 2 Academy of Economic Studies of Moldova |
Materials Research Express |
Nr. 6(8) / 2019 / ISSN - /ISSNe 2053-1591 |
Disponibil online 15 August, 2019. Descarcări-0. Vizualizări-615 |
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